| 摘要 |
A method of surface coating a substrate made of metal or ceramic having a three dimensional configuration such as tools, dies or machinery parts, with a surface reinforcing film with good adhesion, at low temperature, in which at least one deposition film is formed on the surface of the substrate by a plasma vapor deposition CVD process, wherein the deposition film comprises: a multi-layered film comprising one or more of TiAlN film (18a) and a film other than TiAlN having a composition in which the total amount of Ti, Al and N is from 50 to 100 at % and in which the uppermost layer as a surface reinforcing film comprises a TiAlN film, or a multi-layered film comprising two or more of TiAlN films having a composition in which the total amount of Ti, Al and N is from 50 to 100 at % and in which the contents of two or more of elements among Ti, Al and N are in a gradient composition.
|
