| 摘要 |
<p>PCT No. PCT/EP93/03378 Sec. 371 Date Nov. 16, 1994 Sec. 102(e) Date Nov. 16, 1994 PCT Filed Nov. 30, 1993 PCT Pub. No. WO94/12837 PCT Pub. Date Jun. 9, 1994.Provided is a process and an apparatus for producing ultra-high purity monosilane. In a preferred embodiment, the process comprises introducing a monosilane feed gas, which also serves as a heat source, to the lower stage of a rectification column which is sectioned into an upper stage, a middle stage and a lower stage by means of an intermediate portion reboiler-condenser and a lower portion reboiler-condenser. The monosilane feed gas is cooled in the lower portion of the reboiler-condenser so that the higher boiling point components in the feed gas are separated. The remaining lower boiling point components are then introduced into the upper stage by way of the middle stage and the intermediate portion of the reboiler-condenser. The remaining components are condensed in the top portion of the upper stage so that monosilane and the lower boiling point components are separated, with the condensed monosilane becoming a reflux liquid. Ultra-high purity monosilane is thereby obtained and removed from the bottom portion of the upper stage of the unit.</p> |
