| 发明名称 |
POSITIVE RESIST COMPOSITION |
| 摘要 |
<p>A positive resist composition comprising an alkali-soluble phenolic resin, a photosensitive agent composed of a quinonediazide sulfonate of a specific polyhydroxy compound, and an aromatic compound having at least one phenolic hydroxyl group.</p> |
| 申请公布号 |
EP0801327(A1) |
申请公布日期 |
1997.10.15 |
| 申请号 |
EP19950904030 |
申请日期 |
1994.12.28 |
| 申请人 |
NIPPON ZEON CO., LTD. |
发明人 |
KAWATA, SHOJI;KASHIWAGI, MOTOFUMI;KUSUNOKI, TETURYO;NAKAMURA, MASAHIRO |
| 分类号 |
G03F7/022;(IPC1-7):G03F7/022;G03F7/023 |
主分类号 |
G03F7/022 |
| 代理机构 |
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代理人 |
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| 主权项 |
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