发明名称 HAKUTENSHUSEIHOHO
摘要 PURPOSE:To produce a correction film efficiently by setting scanning step intervals large within a range where there is no influence exerted in exposing and setting a correction area circularly. CONSTITUTION:The correction area R1 is set circularly covering a void dot 7 to suppress a depot in a hatched area outside the void dot. Then, a reticle is held under a high vacuum and the periphery of the void dot 7 is filled with the gas containing carbon or Cr as a depot material. Then the area is irradiated by an irradiating beam of about 0.1mum beam diameter at step intervals l1=0.5-1mum to form the correction film 8 without exerting any influence upon transfer sensitivity. This constitution shortens the void dot correction time to about a quarter as long as before.
申请公布号 JP2664218(B2) 申请公布日期 1997.10.15
申请号 JP19880228649 申请日期 1988.09.14
申请人 HITACHI SEISAKUSHO KK 发明人 KOIZUMI YASUHIRO
分类号 G03F1/72;G03F1/74;H01L21/027;H01L21/30 主分类号 G03F1/72
代理机构 代理人
主权项
地址