发明名称 KANHOSHASENKONGOBUTSUOYOBIRERIIFUPATAANNOSEIZOHOHO
摘要 The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. …<??>The radiation-sensitive mixture contains… a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and… b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation,… the polymeric binder (a) containing 5 to 40 mol% of monomer units with copolymerised or co-condensed …<IMAGE>… groupings or …<IMAGE>… groupings introduced by a polymer-analogous reaction, with the proviso that the radical R contains 5 to 9 carbon atoms.
申请公布号 JP2664475(B2) 申请公布日期 1997.10.15
申请号 JP19890115255 申请日期 1989.05.10
申请人 BEE AA ESU EFU AG 发明人 RAINHORUTO SHUARUMU;HORUSUTO BINDAA
分类号 G03F7/023;C08L61/08;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/023
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