发明名称 |
Semiconductor device strucutre having a two-dimensional electron gas and contact thereto |
摘要 |
A semiconductor device includes a very low dopant impurity concentration InGaAs active layer in which a two-dimensional electron gas is produced, the active layer being disposed on a semiconductor substrate; a very low dopant impurity concentration spacer layer contacting the active layer at a first surface and having an electron affinity smaller than the electron affinity of the active layer; and a very thin InGaAs electron supply layer having a high n type dopant impurity concentration and contacting the spacer layer opposite the active layer. Degradation of device characteristics due to heating of the device is reduced with a result that a thermally stable and highly reliable semiconductor device is easily realized.
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申请公布号 |
US5677553(A) |
申请公布日期 |
1997.10.14 |
申请号 |
US19940358712 |
申请日期 |
1994.12.19 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
YAMAMOTO, YOSHITSUGU;YOSHIDA, NAOHITO |
分类号 |
H01L29/812;H01L21/338;H01L29/778;(IPC1-7):H01L31/032;H01L31/033 |
主分类号 |
H01L29/812 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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