发明名称 Semiconductor device strucutre having a two-dimensional electron gas and contact thereto
摘要 A semiconductor device includes a very low dopant impurity concentration InGaAs active layer in which a two-dimensional electron gas is produced, the active layer being disposed on a semiconductor substrate; a very low dopant impurity concentration spacer layer contacting the active layer at a first surface and having an electron affinity smaller than the electron affinity of the active layer; and a very thin InGaAs electron supply layer having a high n type dopant impurity concentration and contacting the spacer layer opposite the active layer. Degradation of device characteristics due to heating of the device is reduced with a result that a thermally stable and highly reliable semiconductor device is easily realized.
申请公布号 US5677553(A) 申请公布日期 1997.10.14
申请号 US19940358712 申请日期 1994.12.19
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 YAMAMOTO, YOSHITSUGU;YOSHIDA, NAOHITO
分类号 H01L29/812;H01L21/338;H01L29/778;(IPC1-7):H01L31/032;H01L31/033 主分类号 H01L29/812
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