Method for the preparation of photoresist solution

摘要

Proposed is a method for the preparation of a photoresist composition in the form of a solution which is free from the troubles due to formation of particles in the solution after prolonged storage. The method comprises the steps of (a) preparing a solution by dissolving an alkali-soluble resin and a quinone diazide group-containing compound in an organic solvent; and (b) subjecting the solution to a heat treatment at 75 DEG to 85 DEG C. for such a length of time that the solution diluted with ethyleneglycol monomethyl ether in a solid concentration of 0.2% has an absorbance of light in the range from 0.05 to 0.75 at a wavelength of 500 nm for an optical path length of 1 cm.