发明名称 SEMICONDUCTOR QUANTUM DOT ELEMENT AND METHOD OF MANUFACTURE
摘要 PROBLEM TO BE SOLVED: To provide a quantum dot element to which carrier is injected effectively without the consumption of the carrier at the quantum well structure around the quantum dot and the method of manufacture. SOLUTION: The quantum doe element comprises a barrier layer 2 that comprises AlGaAs and quantum dots 4 that are made of InGaAs of which band gap is smaller than that of the AlGaAs and of which lattice constant is different from that of the AlGaAs, and is provided with an intermediate layer 3 with the thickness of several atomic layers between the barrier layer 2 and the quantum dots 4 made of InAlAs of which band gap is larger than that of the AlGaAs and of which lattice constant is the same as that of the InGaAs.
申请公布号 JPH09270508(A) 申请公布日期 1997.10.14
申请号 JP19960077772 申请日期 1996.03.29
申请人 NEC CORP 发明人 SAITO HIDEAKI
分类号 H01L29/06;H01L21/203;H01L21/205;H01L29/66;H01L33/06;H01L33/30;H01S5/00 主分类号 H01L29/06
代理机构 代理人
主权项
地址