发明名称 |
Method for E-beam writing |
摘要 |
A method for writing on a semiconductor wafer using electron beams is provided. One embodiment of the method includes the steps of using electron beams to irradiate a semiconductor substrate on which a resist layer has been formed, to thereby draw patterns on the resist layer, and then baking the resist layer and substrate in a vacuum.
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申请公布号 |
US5677109(A) |
申请公布日期 |
1997.10.14 |
申请号 |
US19960736294 |
申请日期 |
1996.10.24 |
申请人 |
NEC CORPORATION |
发明人 |
MORIKAWA, JUNKO;NOZUE, HIROSHI;YAMASHITA, HIROSHI |
分类号 |
H01L21/027;G03F7/20;G03F7/38;H01J37/317;(IPC1-7):G03F7/38 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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