发明名称 Method of making X-ray mask having reduced stress
摘要 A method of making a X-ray mask including: a step of forming a X-ray absorber above a substrate; a step of controlling a stress of the X-ray absorber by a predetermined condition; and wherein the predetermined condition for controlling the stress of the X-ray absorber formed above the substrate is determined by a measured value of a stress of a X-ray absorber formed on a monitor substrate.
申请公布号 US5677090(A) 申请公布日期 1997.10.14
申请号 US19960604678 申请日期 1996.02.21
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 MARUMOTO, KENJI;YABE, HIDEKI;AYA, SUNAO;KISE, KOJI;SASAKI, KEI
分类号 B81B3/00;B81C1/00;G03F1/14;(IPC1-7):G03F9/00 主分类号 B81B3/00
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