发明名称 Lithographic print bias/overlay target and applied metrology
摘要 A print bias target is imaged in a single layer of light-sensitive material. The print bias target is made up of a pair of concentric geometric shapes in which a plurality of target regions forms a plurality of isolated edges. Each target region is of a different image structure than each other target region immediately adjacent thereto. The positioning of a given isolated edge in the print bias target is determined relative to a corresponding isolated edge in the design image from which the print bias target was imaged. Focus setting and/or exposure setting for a lithographic system to minimize print bias may be determined using print bias information obtained from a print bias target matrix of varying exposure and focus. An imaging aberration may also be identified using print bias information from a print bias target matrix, such as lithographic astigmatism, lithographic coma and vibration. A slope of an imaging profile may also be determined from print bias information. Overlay may be determined by imaging a print bias target on top of a prior level image to create an overlay target, determining a center of the prior level image, determining an average center of the print bias target and determining a location of the average center relative to the prior level image center, thereby determining the overlay.
申请公布号 US5677091(A) 申请公布日期 1997.10.14
申请号 US19960646463 申请日期 1996.05.08
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BARR, ROGER LAWRENCE;COUILLARD, PATRICK J.
分类号 G03F7/20;G03F7/207;G03F9/00;(IPC1-7):H01L21/30;G03F1/00 主分类号 G03F7/20
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