| 摘要 |
PROBLEM TO BE SOLVED: To provide an X-ray mask having an alignment mark of high precision lattice pattern. SOLUTION: An alignment mark is constituted of recessed parts and protruding parts which have a plane littice type formed on the surface of an X-ray transmission film 2 by etching. X-ray absorber 3 composed of a Ta film is burried in the recessed parts. Since the X-ray transmission film 2 is constituted of the protruding parts and the recessed parts, and a vissible light reflecting film is buried in the recessed parts, the vissible light casted on the alignment mark generates reflected diffraction light. Since a vissible light transmission film and the vissible light reflecting film are in contact with each other, and the surface part is flattened, a pattern is not inclined by the self-weight or the stress distribution. Thereby a high precision lattice pattern which is arranged at constant pitches on the same plane can be formed, and does not cause alignment error. |
