PRODUCTION OF OPTICAL WAVEGUIDE DEVICE

摘要

PROBLEM TO BE SOLVED: To improve the productivity of a ridge type optical waveguide, to improve the stability of its optical characteristics and the stability of its shape, to prevent the work denatured layer on the surface of the optical waveguide and to control the angle on the flanks of the ridge type optical waveguide with respect to the main surface of a substrate. SOLUTION: The optical waveguide device having the substrate 1 and the ridge type optical waveguide 3 projecting onto the main surface 1a of the substrate 1 is produced. The ridge type optical waveguid 3 is formed by an abrasion working method. Light of a wavelength <=350nm is preferably used as a light source 5 for abrasion working. Light of a wavelength 150 to 300nm is further preferably used and the material of the substrate is more particularly preferably an oxide single crystal.