发明名称 SCANNING-SLIT EXPOSURE DEVICE
摘要 A scanning-slit exposure device is provided with a radiation source (1) emitting radiation pulses through an exit window (2). An imaging system (3) images the exit window onto a surface (4) to be illuminated by the radiation. The surface is scanned relative to the exit window image in a scan direction. To avoid banding-type non-uniformities in the exposure, the device comprises a scattering element (12) which scattering element causes blurring of the exit window image only in the scan direction. The scattering element is arranged in the entrance pupil of the imaging system (3).
申请公布号 WO9737282(A1) 申请公布日期 1997.10.09
申请号 WO1997IB00296 申请日期 1997.03.25
申请人 ASM LITHOGRAPHY B.V. 发明人 JASPER, JOHANNES, CHRISTIAAN, MARIA;STRAAIJER, ALEXANDER
分类号 G02B5/02;G03F7/20;H01L21/027;(IPC1-7):G03F7/20 主分类号 G02B5/02
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