发明名称 HIKARIDEISUKUBAITAINOSEIZOHOHO
摘要 PURPOSE:To easily obtain a substrate having the same land part signal intensity and group part signal intensity by reverse sputtering the substrate surface or the film forming surface prior to the formation of a recording film. CONSTITUTION:The land part signal intensity is decreased and the group part signal intensity is increased by reverse sputtering the substrate surface or the film forming surface prior to the formation of the recording film, for example, a silicon nitride film surface to be used as a protective film prior to the formation of the recording film. The land part signal intensity and the group part signal intensity are, therefore, made into the same intensity if the land part signal intensity is larger than the group part signal intensity in an initial state. The substrate having the same land part signal intensity and the group part signal intensity is obtd. in this way.
申请公布号 JP2661323(B2) 申请公布日期 1997.10.08
申请号 JP19900102257 申请日期 1990.04.18
申请人 NIPPON DENKI KK 发明人 OKADA OSAMU
分类号 G11B7/26;G11B7/24 主分类号 G11B7/26
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