发明名称 Method and apparatus for processing photosensitive lithographic printing plate
摘要 A method for processing a photosensitive lithographic printing plate (PS plate) and an apparatus therefore, the method comprising subjecting the PS plate to imagewise exposure and development, the PS plate comprising a hydrophilic support, a non-silver photosensitive layer being capable of forming a water-insoluble ink receptive image and formed on the hydrophilic support, and a silver halide photosensitive layer formed on the non-silver photosensitive layer, which comprises the steps of (1) or (2): (1) developing the silver halide photosensitive layer, without fixing the developed silver halide photosensitive layer, irradiating the PS plate with light for exposing the non-silver photosensitive layer through the silver halide photosensitive layer subjected to development and remaining unfixed, completing the irradiation such that the irradiation in every irradiated portion is within 3 seconds after the start of the irradiation, eluting the silver halide emulsion layer to remove, and finally developing the non-silver halide photosensitive layer, or (2) developing the silver halide photosensitive layer, without fixing the developed silver halide photosensitive layer, irradiating the non-silver photosensitive layer with light through the dried silver halide photosensitive layer, eluting the silver halide emulsion layer to remove, and finally developing the non-silver halide photosensitive layer. <IMAGE>
申请公布号 EP0733954(A3) 申请公布日期 1997.10.08
申请号 EP19960104618 申请日期 1996.03.22
申请人 FUJI PHOTO FILM CO., LTD. 发明人 NAKAO, SHO
分类号 G03F7/095;G03F7/30 主分类号 G03F7/095
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