| 摘要 |
PROBLEM TO BE SOLVED: To provide projection alignment which aligns the pattern of a reticule on wafers having various exposure layers always in the best focused condition. SOLUTION: When a pattern of a plurality of reticules R is repetitively exposed on a predetermined zone of a photosensitive substrate W, a plurality of light fluxes are directed onto the surface of the photosensitive substrate W through slits of a pattern formation plate 62, and light fluxes reflected by the photosensitive substrate W are detected by a plurality of detectors of a sensor 69 to detect a positional offset on the surface of the substrate W in an optical axis AX direction. Prior to starting the exposure of the respective reticles R, offsets of measuring points corresponding to the plurality of detectors on the substrate W are previously measured. |
