| 摘要 |
Methods of externally exciting a subwavelength source includes illuminating with a first wavelength of light a material capable of excitation to produce a second wavelength of light, the material being mounted in an aperture movable with respect to a sample. The second wavelength light illuminates the sample, which is in the near field of the material producing the second wavelength light. The method further includes moving the material with respect to the sample, and sensing forces produced between the impinging second wavelength light and the sample for near field optical microscopy. Alternatively, the location of the material with respect to the sample is controlled, as for optical lithography. |
