| 摘要 |
PROBLEM TO BE SOLVED: To dispose an evaluation mark on a reticle, by exposing the reticle and an article to be exposed without shifting them, and evaluating the overlapped state of first and second projection aligner evaluation marks both exposed onto the article as an alignment state of both steppers. SOLUTION: A reference point 50 of a pitch 5P lattice on a reticle is defined corresponding to a reference point on a wafer with a 1/5 times stepper, and an evaluation mark (a) is disposed at a position displaced by 5Δx, 5Δy from the reference point 50. In contrast, a reference point 20 of a pitch 2P lattice on a reticle is defined corresponding to a reference point on the wafer with a 1/2 times stepper, and an evaluation mark (b) is disposed at a position displaced by 2Δx, 2Δy from the reference point 20. In such a manner, in the 1/2 times and 1/5 times steppers on the reticle, the evaluation marks are shifted by 2Δx, 2Δy and 5Δx, 5Δy with respect to the two reference points overlapped on the wafer, and disposed without overlapping different magnification evaluation marks in one reticle. |
