发明名称 PRODUCTION OF PHOSPHOR PATTERN
摘要 PROBLEM TO BE SOLVED: To form uniform patterns only on the inside surfaces of a recessed part of a substrate having ruggedness, such as substrate for a PDP with high accuracy and allowance by irradiating the a material to be irradiated imagewise with active rays in the state that gas contg. oxygen exists on the material. SOLUTION: A thermoplastic resin layer is arranged on the upper part of the photosensitive resin compsn. contg. phosphors in a substrate having raggedness and the layer is thermally press bonded in this state. In such a case, the photosensitive resin layer 6 is laminated on the substrate 1 for the PDP formed with barrier ribs 2 and the thermoplastic resin layer 7 is arranged on the photosensitive resin layer 6 and is thermally press bonded thereto. The thermoplastic resin layer 7 is irradiated imagewise with the active rays 11 in the state the gas contg. the oxygen exists on the thermoplastic resin layer 7. At this time. this method of holding spucers 9, etc., on the thermoplastic resin layer 7 in the state that the thermoplastic resin layer 7 comes into direct contact with, for example, the air, etc., and irradiating the layer imagewise with the active rays 11 via a photomask 10, such as negative film or negative glass is exemplified.
申请公布号 JPH09265181(A) 申请公布日期 1997.10.07
申请号 JP19960074962 申请日期 1996.03.28
申请人 HITACHI CHEM CO LTD 发明人 NOJIRI TAKESHI;TACHIKI HIDEYASU;TANAKA HIROYUKI;WADA YUMIKO;TAI SEIJI
分类号 G03F7/004;C09D133/04;C09D133/06;C09K11/08;G03F7/027;G03F7/40;H01J9/227;(IPC1-7):G03F7/004 主分类号 G03F7/004
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