| 摘要 |
PROBLEM TO BE SOLVED: To perform a stand-by processing for a next lot wafer easily with a simplified construction irrespective of an exposure operation parameter of the next lot, by forcing a wafer of the next lot to stand ready at an arbitrary standby position instructed by a user when an exposure processing is applied to a wafer of a present lot. SOLUTION: A wafer 3 after it is exposed to light on a wafer stage 2 is carried out by an arm 13 of a longitudinal slider 8, is then delivered to an arm 10 of a lateral slider 7, and is accommodated in a carrier 6. Herein, an inline delivery unit 14 is provided on one end of the lateral slider 7. The wafer 3 before the exposure and the wafer 3 after the exposure are delivered by the inline delivery unit 14 between the unit 14 and an inline apparatus 15 in which a coater and a developer are accommodated. Hereby, even if the wafer lot is exchanged manually, the exposure processing to the wafer 3 of the next lot is achieved after the exposure processing to the wafer 3 of the present lot is completed. |
