Vapor delivery system for solid precursors and method regarding same

摘要

A vapor delivery system for vaporization and delivery of a solid precursor includes a housing having an inlet for receiving a carrier gas. A rotatable substrate surface is contained in the housing having a solid precursor material applied thereon. A focused thermal beam is positioned for impingement on the solid precursor material. A drive mechanism moves one of the rotatable surface and the focused thermal beam relative to the other such that with rotation of the rotatable substrate surface the focused thermal beam continuously impinges on a different contact area of the solid precursor material for vaporization thereof. The housing further has an outlet for transport of the vaporized precursor material therefrom. The rotatable surface may be a cylindrical surface or a circular platen surface. A CVD system having a vapor delivery system is also provided along with a device for use in the delivery system. A method for delivering the vaporized solid precursor to a CVD process chamber includes providing a surface having a solid precursor material applied thereon. A focused thermal beam is directed at the surface. The surface is rotated and one of the rotating surface and the focused thermal beam are indexed relative to the other such that the directed beam is repetitively moved from impinging upon one path of solid precursor material to a next path of solid precursor material to vaporize the solid precursor material on the surface. The vaporized solid precursor material is then transported to the process chamber.