| 摘要 |
PROBLEM TO BE SOLVED: To reduce the number of exposure times to improve the throughput of an exposure apparatus by exposing one and another division circuit patterns formed on reticles at the same time. SOLUTION: On a region M of a glass substrate, division circuit patterns C1, D1 locate at the left and those C2, D2 locate the right so that patterns C1 and C2 neighbor and those D1 and D2 neighbor. According to the positional relation on the substrate, the patterns C1, D1 also locate at the left and those C2, D2 locate at the right on reticles 16C, 16D so that the patterns C1 and C2 neighbor and those D1 and D2 neighbor. When exposure is made with use of thus formed reticles 16A-16D, the patterns C1 and C2 and those D1 and D2 are exposed at the same time on multiple adjacent regions M. |
