发明名称 |
Process for preparing layered structure including oxide super conductor thin film |
摘要 |
The invention provides a method for preparing a layered structure made up of a plurality of thin films composed of different compositions, in which the method involves using a reactive co-evaporation technique to deposit a first thin film on a substrate using a first set of evaporation sources, and then depositing another thin film of a different composition on the first thin film, using a second set of evaporation sources that has no evaporation sources common with the first set of evaporation sources. In the method, the first thin film is deposited in a first deposition sub-chamber and the second thin film is deposited in a second deposition subchamber, both of which are part of a single vacuum chamber.
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申请公布号 |
US5674813(A) |
申请公布日期 |
1997.10.07 |
申请号 |
US19960679997 |
申请日期 |
1996.07.15 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
NAKAMURA, TAKAO;IIYAMA, MICHITOMO |
分类号 |
C01G1/00;C23C14/08;C23C14/24;C23C14/50;C23C14/56;C30B23/02;C30B23/08;C30B25/02;H01L21/203;H01L39/24;(IPC1-7):C23C14/24;B05D5/12 |
主分类号 |
C01G1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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