发明名称 Process for preparing layered structure including oxide super conductor thin film
摘要 The invention provides a method for preparing a layered structure made up of a plurality of thin films composed of different compositions, in which the method involves using a reactive co-evaporation technique to deposit a first thin film on a substrate using a first set of evaporation sources, and then depositing another thin film of a different composition on the first thin film, using a second set of evaporation sources that has no evaporation sources common with the first set of evaporation sources. In the method, the first thin film is deposited in a first deposition sub-chamber and the second thin film is deposited in a second deposition subchamber, both of which are part of a single vacuum chamber.
申请公布号 US5674813(A) 申请公布日期 1997.10.07
申请号 US19960679997 申请日期 1996.07.15
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NAKAMURA, TAKAO;IIYAMA, MICHITOMO
分类号 C01G1/00;C23C14/08;C23C14/24;C23C14/50;C23C14/56;C30B23/02;C30B23/08;C30B25/02;H01L21/203;H01L39/24;(IPC1-7):C23C14/24;B05D5/12 主分类号 C01G1/00
代理机构 代理人
主权项
地址