Verfahren zur Vorbehandlung der Reaktionskammer und/oder des Substrates für die Selektive Auftragung des Wolframs,申请号DE19936008970T-传众专利搜索

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发明名称	Verfahren zur Vorbehandlung der Reaktionskammer und/oder des Substrates für die Selektive Auftragung des Wolframs
摘要
申请公布号	DE69308970(T2)	申请公布日期	1997.10.02
申请号	DE19936008970T	申请日期	1993.09.01
申请人	FRANCE TELECOM, PARIS, FR	发明人	RIVOIRE, MAURICE, F-38240 MEYLAN, FR
分类号	C23C16/02;C23C16/04;C23C16/14;C23C16/44;H01L21/28;H01L21/285;H01L21/768;(IPC1-7):C23C16/02	主分类号	C23C16/02
代理机构		代理人
主权项
地址

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