发明名称 |
INSULATED GATE BIPOLAR TRANSISTOR HAVING A TRENCH AND A METHOD FOR PRODUCTION THEREOF |
摘要 |
An IGBT comprises a drain (1), a highly doped p-type substrate layer (2), a highly doped n-type buffer layer (3), a drift layer (4), a p-type base layer (5), a highly doped n-type source region layer (6) and a source (7). There is also a trench (8) etched in the base layer. It has also an insulating layer (9) with a gate electrode (10) thereon arranged on the base layer from the source region layer (6) to the drift layer (4) for the creation of a conducting inversion channel there. A contact portion (11) is present and it is both vertically separated from the source region layer (6) and has the source (7) applied thereon for collecting holes injected from the substrate layer to the drift layer at a vertical distance from said source region layer (6).
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申请公布号 |
WO9736329(A1) |
申请公布日期 |
1997.10.02 |
申请号 |
WO1997SE00531 |
申请日期 |
1997.03.26 |
申请人 |
ABB RESEARCH LIMITED;HARRIS, CHRISTOPHER;BAKOWSKI, MIETEK;GUSTAFSSON, ULF |
发明人 |
HARRIS, CHRISTOPHER;BAKOWSKI, MIETEK;GUSTAFSSON, ULF |
分类号 |
H01L21/331;H01L29/06;H01L29/10;H01L29/739;(IPC1-7):H01L29/739;H01L29/78 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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