发明名称 INSULATED GATE BIPOLAR TRANSISTOR HAVING A TRENCH AND A METHOD FOR PRODUCTION THEREOF
摘要 An IGBT comprises a drain (1), a highly doped p-type substrate layer (2), a highly doped n-type buffer layer (3), a drift layer (4), a p-type base layer (5), a highly doped n-type source region layer (6) and a source (7). There is also a trench (8) etched in the base layer. It has also an insulating layer (9) with a gate electrode (10) thereon arranged on the base layer from the source region layer (6) to the drift layer (4) for the creation of a conducting inversion channel there. A contact portion (11) is present and it is both vertically separated from the source region layer (6) and has the source (7) applied thereon for collecting holes injected from the substrate layer to the drift layer at a vertical distance from said source region layer (6).
申请公布号 WO9736329(A1) 申请公布日期 1997.10.02
申请号 WO1997SE00531 申请日期 1997.03.26
申请人 ABB RESEARCH LIMITED;HARRIS, CHRISTOPHER;BAKOWSKI, MIETEK;GUSTAFSSON, ULF 发明人 HARRIS, CHRISTOPHER;BAKOWSKI, MIETEK;GUSTAFSSON, ULF
分类号 H01L21/331;H01L29/06;H01L29/10;H01L29/739;(IPC1-7):H01L29/739;H01L29/78 主分类号 H01L21/331
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