发明名称 Photopolymerizable sensitive material
摘要 A photopolymerizable sensitive material which comprises a support, a photopolymerizable sensitive layer comprising (A) an addition polymerizable compound having at least one ethylenically unsaturated bond, (B) a photopolymerization initiator to be activated by active light rays and (C) a polymer binder, formed on the support, and a protective layer formed thereon, wherein said protective layer comprises at least (a) a polyvinyl alcohol and/or a polyvinyl alcohol derivative, and (b) a polyvinyl pyrrolidone having a weight average molecular weight of from 20,000 to 500,000 and/or a vinyl pyrrolidone copolymer containing at least 50 mol% of vinyl pyrrolidone as a copolymer component and having a weight average molecular weight of from 10,000 to 400,000, and the proportion of component (a) in the total amount of components (a) and (b) is from 25 to 75 wt%.
申请公布号 EP0738929(A3) 申请公布日期 1997.10.01
申请号 EP19960106125 申请日期 1996.04.18
申请人 MITSUBISHI CHEMICAL CORPORATION 发明人 TSUCHIYAMA, MASAAKI,
分类号 G03F7/029;G03F7/031;G03F7/032;G03F7/09;G03F7/11 主分类号 G03F7/029
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