发明名称 |
PURAZUMANOFUKINITSUSEIOHOSEISURUPURAZUMASOCHI |
摘要 |
<p>A device for reducing plasma irregularities includes an electrode assembly capable of applying an electric potential to said plasma. The electrode assembly includes a portion for reducing the plasma irregularities. The portion which reduces the plasma irregularities includes alternately a buried portion which is capable of altering the potential within the buried element, or else a conditioned portion of the surface which controls reflectivity and/or emissivity of portions of a surface of the electrode assembly differently. <IMAGE></p> |
申请公布号 |
JP2659919(B2) |
申请公布日期 |
1997.09.30 |
申请号 |
JP19940296306 |
申请日期 |
1994.11.30 |
申请人 |
INTAANASHONARU BIJINESU MASHIINZU CORP |
发明人 |
GEIRII ESU SERUIN;MANOJU DARUII;SHII RICHAADO GYARUNIERI;JEIMUSU JEI MATSUKUGIRU;GEIRII DABURYU RABORUFU;MAHESUWARAN SURENDORA |
分类号 |
H05H1/46;H01J37/32;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H01L21/683;(IPC1-7):H01L21/306;H01L21/68 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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