Apparatus for depositing a thin layer on a substrate by laser pulse vapor deposition

摘要

A method for depositing a thin layer on a substrate by laser pulse vapor deposition provides a substantially cylindrical target having a cylinder axis and a curved target surface. A pulsed laser beam is generated having an initial path section and an initial path section axis and is capable of producing a plasma plume from the target when the pulsed laser beam impinges on the curved target surface. A first mirror located between the target and the initial path section of the laser beam is provided having a plurality of reflective interior surfaces and a first mirror axis substantially coincident with an initial path section axis of the laser beam. The laser beam is deflected so as to impinge on the reflective interior surface of the first mirror and subsequently to be reflected and to impinge on the curved target surface by controlling a plane reflective mirror that intersects the first mirror axis and is located on a side of the first mirror opposite from the target. The plane reflective mirror is tilted at an angle to the laser beam axis and is rotatable about a rotation axis substantially coincident with the first mirror axis. The laser beam is focussed on a center of the target to produce the plasma plume on the curved target surface. The plasma plume is moved on the curved target surface over a track by moving a position where the laser beam impinges on the reflective interior surface of the first mirror step-by-step rotation of the plane reflective mirror about the rotation axis, with a thin layer being deposited with a substantially uniform thickness on the substrate by contact of the plasma plume with the substrate. The first mirror includes a plurality of plane mirrors connected in a cylindrical manner.