发明名称 PRODUCTION OF SILICON SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a silicon single crystal having an arbitrary oxygen concentration, capable of preventing polycrystallization in growth. SOLUTION: This method for producing a silicon single crystal comprises melting a silicon raw material in a decompressed inert atmosphere and pulling up the melt by using a seed crystal. In the production, the single crystal having 1.5×10<18> atoms/cm<3> oxygen concentration is pulled up by using a crucible wholly composed of boron nitride. A quartz is immersed in a silicon melt and a single crystal having an arbitrary oxygen concentration is pulled up.
申请公布号 JPH09255489(A) 申请公布日期 1997.09.30
申请号 JP19960071908 申请日期 1996.03.27
申请人 SUMITOMO SITIX CORP 发明人 SHIRAKAWA YOSHINORI
分类号 C30B15/10;C30B29/06;H01L21/208;(IPC1-7):C30B29/06 主分类号 C30B15/10
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