| 摘要 |
PURPOSE:To easily verify the design data on the phase shift mask for semiconductor integrated circuit transfer at low cost in a short time without actually manufacturing any mask. CONSTITUTION:A desired pattern is processed by a bit map expanding circuit 1 and stored in a memory circuit 2. The light shield pattern and shifter pattern of the phase shift mask are processed by bit map expanding circuits 3 and 4 respectively and stored in memory circuits 5 and 6. Both image signals are put together by a memory circuit 7 and processed by a mask optical image forming circuit 8 into an optical image, which is stored in a memory circuit 9. A comparative arithmetic circuit 10 verifies images of both the memory circuits 2 and 9. |
