FABRICATION METHOD OF X-RAY MASK

摘要

A fabrication method of X-ray mask is provided to reduce stress at the time of X-ray exposing using a guard ring. The method comprises the steps of: depositing an oxide layer(6) and a nitride layer(3) on a front and rear side of a silicon wafer(1), respectively; forming a guard ring(7) by etching the oxide layer(6) under CHF3/C2F6/He gas and the silicon wafer(1) under SF6 gas; depositing a silicon nitride(2) on the front side of the silicon wafer(1); defining an PMMA pattern(4) by E-bean exposure; and plating a gold metal(5) and lift-off the PMMA pattern(4). Thereby, it is possible to easily form a fine pattern without generating of stress by using the guard ring(7).