DETERMINING CHARACTERISTIC PARAMETERS BY POLARISED LIGHT

摘要

Plasma interaction with solid surface (during the etching or deposition) is monitored by utilising the effect of changes of state of polarisation of light. The substrate changes physical parameters during plasma processing. The monitored light is a representative of the composition of substrate surface as well as composition changes associated with plasma processing. The light reflected from the surface is analysed by a system commonly used in ellipsometry, but modified by implementation of a new method of calculation. Periodicity in state of polarisation of light is used as a reference point to monitor the occurrences on surface in real time. It is also used for quantitative and qualitative chemical analysis of the surface.