Drying process for wet semiconductor discs

摘要

A drying process for e.g. semiconductor discs which bear water residues comprises: (a) drying in an atmosphere containing gaseous carbon dioxide at a concentration of 0.7 to 100% by volume; (b) incorporating isopropanol vapour in the atmosphere; and (c) throwing off the water residues by spinning the semiconductor discs, the water-moist residues containing carbon dioxide.