| 摘要 |
PURPOSE:To form a low-resistivity transparent conductive film at least on a color filter of a glass substrate provided with the color filter or on an org. substrate with good adhesion even when the temp. of the substrate is low. CONSTITUTION:The surface of a glass substrate 18 provided with a color filter consisting of an org. material is irradiated with the ion generated from an ion gun 4, then the arc-discharge plasma 19 generated by an arc discharge is focused on the vapor-deposition material for transparent conductive film to vaporize the material, and the vaporized material is deposited at least on the color filter. Consequently, a highly adhesive transparent conductive film is obtained and never released from in patterning. A low-resistivity transparent conductive film is formed even when the substrate is kept at a low temp. of about 200 deg.C, the film forming time is remarkably shortened because the film forming rate is high, and productivity is improved. |
