发明名称 Field effect transistor having contact layer of transistor gate electrode material
摘要 Improved field effect transistor (FET) structures are described. They include a thin film transistor (TFT), wherein a contact layer directly connects a diffusion region of the TFT to an active site of another device, e.g., another transistor. This invention is especially suitable for TFT's which are built on one or more conductive studs. Static random access memory (SRAM) cells incorporating one or more of the TFT's are also described. Moreover, this invention is directed to methods for preventing or alleviating the problems associated with gouging during formation of contact layers.
申请公布号 US5670812(A) 申请公布日期 1997.09.23
申请号 US19950536725 申请日期 1995.09.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 ADLER, ERIC;KULKARNI, SUBHASH BALAKRISHNA;MANN, RANDY WILLIAM;RAUSCH, WERNER ALOIS;TERNULLO, JR., LUIGI
分类号 H01L27/06;H01L27/11;H01L27/12;(IPC1-7):H01L27/01 主分类号 H01L27/06
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