| 摘要 |
A method of determining position offset is obtained which allows accurate determination of the magnitude of position offset even though the magnitudes of position offset of the outermost shots are not actually measured. According to the method of determining position offset, magnitudes of offset of the designated shots on the surface of a wafer other than the outermost shots are actually measured, and based on the measured magnitudes of offset, the magnitudes of position offset of the outermost shots are calculated and magnitudes of offset are calculated finally taking into consideration the magnitudes of position offset of the outermost shots. As a result, accurate error data can be derived even without actually measuring the magnitudes of offset of the outermost shots.
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