| 发明名称 |
Methodology for monitoring solvent quality |
| 摘要 |
The quality of solvents used in semiconductor manufacturing for removing photoresist or post halogen etch cleanup is monitored by measuring the conductivity of the solvents.
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| 申请公布号 |
US5670376(A) |
申请公布日期 |
1997.09.23 |
| 申请号 |
US19940355787 |
申请日期 |
1994.12.14 |
| 申请人 |
LUCENT TECHNOLOGIES INC. |
发明人 |
OBENG, YAW SAMUEL |
| 分类号 |
G01N27/10;G01N27/06;H01L21/027;H01L21/302;H01L21/306;(IPC1-7):G01N35/00 |
主分类号 |
G01N27/10 |
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