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发明名称
SEMICONDUCTOR WAFER SURFACE CLEANING METHOD
摘要
申请公布号
JPH09251973(A)
申请公布日期
1997.09.22
申请号
JP19960058896
申请日期
1996.03.15
申请人
TOSHIBA CORP
发明人
YAMAZAKI HIDEYUKI
分类号
H01L21/304;(IPC1-7):H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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