发明名称 ALIGNER AND EXPOSING METHOD
摘要 PROBLEM TO BE SOLVED: To reduce the time required for exposure transfer in an apparatus and method for exposure. SOLUTION: Two sets of holders 11, 12 for holding an original sheet 4 and substrate 5 are disposed on a scan stage 3 to scan between two sets of relay optical systems 20, 21 provided according to the scan positions P1, P2, P3 of the original sheet 4 and substrate 5 and a projection optical system 9. During exposure scanning of one substrates 5A, 5B, the other substrates 5B, 5A are aligned to thereby greatly improve the exposure scan and alignment efficiency of the substrate 5.
申请公布号 JPH09251952(A) 申请公布日期 1997.09.22
申请号 JP19960085808 申请日期 1996.03.14
申请人 NIKON CORP 发明人 SHIRASU HIROSHI;KAKIZAKI YUKIO
分类号 G03F9/00;G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F9/00
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