METHOD AND DEVICE FOR EXPOSURE

摘要

PROBLEM TO BE SOLVED: To give adequate exposure on a photosensitive substrate even though the luminance of a light source is so high that the exposure can not be adjusted to an adequate value only by the control of the scanning speed of the photosensitive substrate to an illumination optical system. SOLUTION: The combination of adequate control condition is set on plural luminous flux control means 12 based on a stored result S6 which is obtained by correspondingly storing the control condition of a luminous flux control means 12 controlling respective primary luminous fluxes L6 to L8 outgoing from plural light sources 10 and the illuminance of secondary luminous fluxes L1 to LS obtained by condensing and dividing the primary luminous fluxes L6 to L8 by a light transmission path 14 in a storing means 23.