EXPOSURE INTENSITY DISTRIBUTION DISPLAY METHOD AND MASK PATTERN EDITION DEVICE

摘要

PROBLEM TO BE SOLVED: To make it possible to display the number and density of contour lines in the same way in spite of a difference in its relative intensity value if the exposure intensity distribution is the same and to quantitatively recognize the change in the shapes of the resist patterns with a fluctuation in the exposure at a certain ratio. SOLUTION: This edition device has a position input edition section 5 of mask patterns for LSIs, an exposure intensity distribution calculating section 52 for researching the intensity distribution of the light to be cast through the mask patterns to the resist surface on a sample and a graphic display section 53 which simultaneously displays the mask patterns and the exposure intensity distribution. A contour line display calculating section 57 is installed between the exposure intensity distribution calculating section 52 and the graphic display section 53. The exposure intensity distribution is displayed by the contour lines given by Ie/(1+an/100) [a is a specified ratio (%) and n is an integer] with respect to arbitrary set intensity Ie.