| 摘要 |
<p>PROBLEM TO BE SOLVED: To easily and accurately attain a deposition condition and continuously manufacture a constitutional layer, by modulating total ion collision energy by voltage bias adjustment, and depositing a plurality of layers having a specific characteristic. SOLUTION: A deposition substrate 101 and a pilot unit 307 of a multiphase substance are set up through a substrate holding fixture 304 and an ion source fixture 302 in a pressure reducing vessel 306. By a DC power source 312, a pulse power source 310 and a DC arc power source 308, the pilot unit 307 is vaporized and ionized, so as to form a plurality of gas plasmas having total ion collision energy. Here, by adjusting a voltage bias to the substrate 101, the total ion collision energy is modulated, a plurality of layers having a specific characteristic is deposited on the deposition substrate 101. In this way, without causing a problem of stability due to containing hydrogen, a deposition condition can be easily and accurately attained. A constitutional layer can be continuously manufactured, necessity for many processes with a long time taken is eliminated.</p> |
