| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a thin-film black matrix (BM) that is uniform in thickness and has a smooth surface. SOLUTION: A thin film is formed by applying a forming solution, which contains black pigment particles, a photosensitive organic Si compound, and a high-boiling-point polar solvent, to the surface of a glass substrate, and after the thin film is exposed to light via a mask, it is developed and the glass substrate is baked to manufacture a black matrix. Since the photosensitive organic Si compound is converted to SiO2 by the baking, the black matrix is remarkably high in bonding strength and good at optical characteristics. Its surface (a) is as flat as plate glass and has good luster. Conventional black matrices have uneven surfaces as they cause aggregation of pigments 1. Stresses produced inside the film when SiO2 is generated by the baking of the photosensitive Si compound are eased by the photosensitive group of the photosensitive organic Si compound. The black matrix can be thickened, and resists cracking during manufacture if its film thickness is about 25μm.
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