Method and apparatus for holographically recording an essentially periodic pattern

摘要

The present invention relates to a method and an apparatus for holographically recording periodic or quasi-periodic features of a mask (14) in a holographic recording layer (17). In holographic lithography the object beam (11) is directed to the first substrate (19) bearing a holographic recording layer (17) such that it passes the mask substrate (13) and interferes with a reference beam (15) in the recording layer (17) to form a hologram of the mask pattern (14). According to the new method the object beam (11) is directed to the second substrate (13) at an off-axis angle and the wavelength used and/or the angle of incidence of the object beam (11) are selected according to the period of the features to be recorded such that essentially just the zero and one of the first diffraction orders are present for forming the hologram. <IMAGE>