| 摘要 |
A photosensitive resin composition for producing a relief printing plate is disclosed, which comprises a polymer selected from the group consisting of a prepolymer, a binder polymer and a mixture thereof, an ethylenically unsaturated monomer, a specific hindered amine and a photopolymerization initiator. Even when the photosensitive resin composition is excessively irradiated with strong actinic rays in order to cure the resin composition to its inner portion sufficiently, the surface of the resin composition does not undergo photodeterioration by virtue of the hindered amine contained therein, thereby imparting excellent toughness to the photocured resin composition throughout the entire thickness thereof. Thus, a relief printing plate having excellent printing resistance can be produced. |
