| 摘要 |
A method of defining a line width includes forming a spacer (45) over a layer (42) and using the spacer (45) as an etch mask (57) while etching the layer (42). In this manner, a width (47) of the spacer (45) is used to define a width or line width (47) for the layer (42). Another method of using a spacer to define a line width includes forming a spacer (14) over a substrate (11), depositing a layer (15) over the substrate (11) and the spacer (14), planarizing the layer (15) to expose the spacer (14), and removing the spacer (14) to form an opening (19) over the substrate (11), wherein the opening (19) has a width or line width (17) of the spacer (14).
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