发明名称 |
Discharge chamber and method of manufacturing the same |
摘要 |
A discharge chamber wherein incomplete discharge arising from a discharge electrode surface condition is suppressed and a manufacturing method for the discharge chamber are disclosed. The discharge chamber includes a first substrate, a plurality of discharge electrodes formed on a surface of the first substrate by printing and baking, a second substrate adhered to the first substrate with a predetermined gap left therebetween, and ionizable gas enclosed in the gap. The discharge electrodes have clean surfaces from which insulating substances have been removed, and have a uniform composition in a horizontal direction and a depthwise direction. A plurality of barrier ribs are formed between the first and second substrates by printing and baking such that they overlap partially with the discharge electrodes. Insulating substances which make an obstacle to plasma discharge have been removed from exposed portions of the discharge electrodes at which the discharge electrodes are not covered with the barrier ribs.
|
申请公布号 |
US5667705(A) |
申请公布日期 |
1997.09.16 |
申请号 |
US19960667475 |
申请日期 |
1996.06.24 |
申请人 |
SONY CORPORATION |
发明人 |
MIYAZAKI, SHIGEKI;SEKI, ATSUSHI |
分类号 |
G02F1/133;G09G3/36;H01J9/14;H01J9/24;H01J17/48;(IPC1-7):B23K10/00 |
主分类号 |
G02F1/133 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|