High purity fused silica having high resistance to optical damage

摘要

The invention relates to the production of high purity fused silica glass which is highly resistant to optical damage by ultraviolet radiation in the laser wavelength of about 300 nm or shorter. In particular, this invention relates to a fused silica optical member or blank which exhibits substantially no optical damage up to 107 pulses (350 mJ/cm2) at the KrF laser wavelength region of about 248 nm, and at the ArF laser wavelength region of about 193 nm.