Process for the fabrication of a structural and optical element

摘要

A process for the fabrication of a structural element, in particular an optical element comprises a carrier substrate as well as a layer system, with at least one dielectric layer stepped with respect to its thickness in at least one region opposite at least one second region. The dielectric layer is of the type MeOx and is applied onto a base, where Me is a metal whose atomic mass is at least 44, and x is selected so that the coefficient of absorption of the layer material at light of wavelength lambda =308 nm is k308